Display apparatus

ABSTRACT

A display apparatus includes: a first substrate and a second substrate arranged so as to face each other; a display region included in each of the first substrate and the second substrate; a transparent region formed inside the display region in a planar view; a frame region formed between the display region and the transparent region so as to surround the transparent region along an outer edge of the transparent region in a planar view; a polarizer formed in either the first substrate or the second substrate and having an opening overlapping the transparent region; a first transparent conductive film formed in a first conductive layer between the first substrate and the second substrate; and a second transparent conductive film formed in a second conductive layer between the first conductive layer and the second substrate. The second transparent conductive film is in the frame region in a planar view.

CROSS REFERENCES TO RELATED APPLICATIONS

The present application is a continuation of International ApplicationNo. PCT/JP2019/040202 filed on Oct. 11, 2019, and claims priority toJapanese Patent Application No. 2018-215879 filed on Nov. 16, 2018, thedisclosure of which is incorporated herein by reference.

TECHNICAL FIELD

The present invention relates to a technique of a display apparatus, andrelates to a technique effectively applied to a display apparatus havinga transparent region not overlapping a pixel in a display region.

BACKGROUND ART

Patent Document 1 (Japanese Patent Application Laid-Open Publication No.2006-343728) describes a display apparatus having a light-blocking unitthat is arranged between an image display unit and a transparent displayunit. Patent Document 2 (U.S. Patent Application Laid-Open PublicationNo. 2017/0123452) describes a display apparatus having a transparentregion that is arranged at a position overlapping a camera.

RELATED ART DOCUMENTS Patent Documents

-   Patent Document 1: Japanese Patent Application Laid-Open Publication    No. 2006-343728-   Patent Document 2: U.S. Patent Application Laid-Open Publication No.    2017/0123452

SUMMARY OF THE INVENTION Problems to be Solved by the Invention

For display apparatuses, it is necessary to increase an occupancy of aneffective display region by reducing an area of a non-display regioninside a display region as small as possible. As part of working forachieving this necessity, the inventors of the present application havestudied a technique for, for example, increasing an area of the displayregion reaching a position surrounding a region where a component suchas a camera is arranged. In a planar view, in order to arrange avisible-light transmittable transparent region where the component suchas the camera is arranged, inside the display region, it is necessary tosuppress change in electrical characteristics of the display regionaround the transparent region due to the arrangement of the transparentregion.

A purpose of the present invention is to provide a technique capable ofimproving a performance of a display apparatus.

Means for Solving the Problems

A display apparatus according to one aspect of the present inventionincludes: a first substrate and a second substrate arranged so as toface each other; a display region included in each of the firstsubstrate and the second substrate; a transparent region formed insidethe display region in a planar view; a frame region formed between thedisplay region and the transparent region so as to surround thetransparent region along an outer edge of the transparent region in aplanar view; a polarizer formed in either the first substrate or thesecond substrate and having an opening overlapping the transparentregion; a first transparent conductive film formed in a first conductivelayer between the first substrate and the second substrate; and a secondtransparent conductive film formed in a second conductive layer betweenthe first conductive layer and the second substrate. In a planar view,the frame region includes the first transparent conductive film or thesecond transparent conductive film.

BRIEF DESCRIPTIONS OF THE DRAWINGS

FIG. 1 is a plan view of a region of a display surface showing oneexample of a display apparatus according to one embodiment;

FIG. 2 is a cross-sectional view taken along a line A-A of FIG. 1;

FIG. 3 is an enlarged cross-sectional view taken along a line B-B ofFIG. 1;

FIG. 4 is a circuit diagram showing a circuit configuration example inperiphery of a pixel included in the display apparatus shown in FIG. 1;

FIG. 5 is an enlarged cross-sectional view of a display region of thedisplay apparatus shown in FIG. 2;

FIG. 6 is a plan view showing a layout example of a common electrode(detection electrode) included in the display apparatus shown in FIG. 1;

FIG. 7 is an enlarged plan view showing a layout of a transparentconductive film arranged in a transparent region of FIG. 6;

FIG. 8 is an enlarged cross-sectional view taken along a line A-A ofFIG. 7;

FIG. 9 is an enlarged cross-sectional view of a display apparatusaccording to a modification example of the display apparatus shown inFIG. 3;

FIG. 10 is an enlarged plan view showing a layout of a transparentconductive film arranged in a transparent region of the displayapparatus shown in FIG. 9;

FIG. 11 is an enlarged cross-sectional view taken along a line A-A ofFIG. 10;

FIG. 12 is an enlarged plan view showing a modification example of thedisplay apparatus shown in FIG. 10;

FIG. 13 is an enlarged cross-sectional view taken along a line A-A ofFIG. 12;

FIG. 14 is an enlarged plan view showing another modification example ofthe display apparatus shown in FIG. 7;

FIG. 15 is an enlarged cross-sectional view taken along a line A-A ofFIG. 14;

FIG. 16 is an enlarged plan view of a display apparatus according toanother modification example of the display apparatus shown in FIG. 7;and

FIG. 17 is an enlarged plan view of a display apparatus according tostill another modification example of the display apparatus shown inFIG. 12.

BEST MODE FOR CARRYING OUT THE INVENTION

Hereinafter, each embodiment of the present invention will be describedwith reference to the accompanying drawings. Note that only one exampleis disclosed, and appropriate modification keeping the concept of thepresent invention which can be easily anticipated by those who areskilled in the art is obviously within the scope of the presentinvention. Also, in order to make the description clear, a width, athickness, a shape, and others of each portion in the drawings areschematically illustrated more than those in an actual aspect in somecases. However, the illustration is only an example, and does not limitthe interpretation of the present invention. In the presentspecification and each drawing, similar elements to those describedearlier for the already-described drawings are denoted with the same orsimilar reference characters, and detailed description for them isappropriately omitted in some cases.

In the following embodiments, a liquid crystal display apparatus havinga liquid crystal layer that is an electrooptic layer will beenexemplified as the display apparatus for explanation. However, thefollowing techniques explained are applicable to not only the liquidcrystal display apparatus but also various modification examples. Forexample, the electrooptic layer may be a layer including an elementhaving an optical property that is changeable when being applied withelectrical energy, such as not only a liquid crystal layer but also anorganic luminous element layer, an inorganic luminous element layerincluding a micro LED, a MEMS (Micro Electro Mechanical Systems)shutter, an electrophoretic element layer or others.

The liquid crystal display apparatuses are roughly classified into thefollowing two types depending on an application direction of an electricfield for use in changing alignments of liquid crystal molecules of aliquid crystal layer. That is, a first type is so-called verticalelectric field mode that applies the electric field in a thicknessdirection (or an out-of-plane direction) of the display apparatus. Thevertical electric field mode includes, for example, a TN (TwistedNematic) mode, a VA (Vertical Alignment) mode and others. A second typeis so-called horizontal electric field mode that applies the electricfield in a planar direction (or an in-plane direction) of the displayapparatus. The horizontal electric field mode includes, for example, anIPS (In-Plane Switching) mode, a FFS (Fringe Field Switching) mode thatis one of the IPS modes and others. The following techniques explainedis applicable to both the vertical electric field mode and thehorizontal electric field mode. However, in embodiments explained below,the display apparatus of the horizontal electric field mode will beexemplified for explanation.

First Embodiment

<Configuration of Display Apparatus>

First, a configuration of the display apparatus will be explained. FIG.1 is a planar view of a region of a display surface as one example ofthe display apparatus of the present embodiment. In FIG. 1, each of aboundary between the display region DA and the peripheral region PFA, aboundary between the display region DA and the frame region FRA and aboundary between the frame region FRA and the transparent region TRA isillustrated with a dashed double-dotted line. In FIG. 1, a region wherea sealing member SLM is arranged is illustrated with a dot pattern. FIG.2 is a cross-sectional view taken along a line A-A of FIG. 1. Although aplurality of conductive layers and insulating layers in addition to theliquid crystal layer LQ exist between a substrate 10 and a substrate 20as shown in FIG. 5 described later, illustration of these layers isomitted in FIG. 2. FIG. 3 is an enlarged cross-sectional view takenalong a line B-B of FIG. 1. FIG. 4 is a circuit diagram showing anexample of a circuit configuration in periphery of a pixel in thedisplay region DA included in the display apparatus shown in FIG. 1.FIG. 5 is an enlarged cross-sectional view of the display region of thedisplay apparatus shown in FIG. 2. In FIG. 5, in order to show anexample of positional relation between a scan signal line GL and animage signal line SL in a thickness direction of the substrate 10 (a “Z”direction shown in FIG. 5), the scan signal line GL that is arranged ona different cross section from that of FIG. 5 is illustrated with adotted line.

As shown in FIG. 1, the display apparatus DSP1 of the present embodimentincludes the display region DA. In the display region DA, an image isformed in accordance with an input signal that is supplied from outside.The display region DA is an effective region where the display apparatusDSP1 displays the image in a planar view in which the display surface isviewed. The display apparatus DSP1 includes the peripheral region(non-display region) PFA in periphery of the display region DA in aplanar view. While the display apparatus DSP1 includes the peripheralregion PFA in periphery of the display region DA, a display apparatusincluding a display region DA reaching an edge is also exemplified as amodification example. The techniques described below are also applicableto the display apparatus of such a type including the display region DAreaching the edge of the display apparatus. While the display region DAof the display apparatus DSP1 shown in FIG. 1 is rectangular, thedisplay region may be not rectangular but polygonal or circular. Forexample, each of four corners of the display region DA is rounded insome cases.

The display apparatus DSP1 also includes the transparent region TRA andthe frame region FRA inside the display region DA in a planar view. Theframe region FRA surrounds the transparent region TRA along an outeredge of the transparent region TRA in a planar view, and is between thedisplay region DA and the transparent region TRA. The frame region FRAis shielded from the light by a light-blocking film BM described later,and the frame region FRA is also referred to as a “light-blockingregion”. The transparent region TRA is a region where a component suchas a camera CAM (see FIG. 3) attached to the display apparatus DSP1 isarranged. The transparent region TRA is formed so as to transmit visiblelight in order to emit the visible light to the component such as thecamera CAM. In a substrate and a polarizer configuring the displayapparatus, for example, an opening is formed in the transparent regionTRA. Alternatively, in the transparent region TRA, a visible-lighttransmittable member is arranged but a light-blocking member such as ametal wiring is not arranged. In the transparent region TRA and theframe region FRA, note that components such as a microphone and aspeaker may be arranged in addition to the camera CAM.

As shown in FIG. 2, the display apparatus DSP1 includes the substrate 10and the substrate 20 that are bonded to each other through the liquidcrystal layer LQ so as to face each other. The substrate 10 and thesubstrate 20 face each other in the thickness direction (Z direction) ofthe display apparatus DSP1. The substrate 10 has a front surface (mainsurface, plane) 10 f that faces the liquid crystal layer LQ (and thesubstrate 20). And, the substrate 20 has a back surface (main surface,plane) 20 b that faces the front surface 10 f of the substrate 10 (andthe liquid crystal layer LQ). The substrate 10 is an array substrate inwhich a plurality of transistors (transistor elements) Tr1 (see FIG. 4)functioning as switching elements (active elements) are arranged in anarray form. The substrate 20 is a substrate that is formed in a regioncloser to the display surface. The substrate 20 can be also referred toas an opposed substrate meaning a substrate that is arranged to face thearray substrate.

The liquid crystal layer LQ is between the front surface 10 f of thesubstrate 10 and the back surface 20 b of the substrate 20. The liquidcrystal layer LQ is an electrooptic layer that controls a state oftransmittance of the visible light. This has a function of modulatinglight that travels through itself by controlling a state of an electricfield that is formed around the liquid crystal layer LQ through theswitching element. The display region DA included in the substrate 10and the substrate 20 overlaps the liquid crystal layer LQ as shown inFIG. 2.

The substrate 10 and the substrate 20 are bonded to each other through asealing member (adhesive member) SLM. As shown in FIG. 1, the sealingmember SLM is arranged in the peripheral region PFA so as to surroundthe display region DA. As shown in FIG. 2, the liquid crystal layer LQis inside the sealing member SLM. The sealing member SLM plays a role ofa sticker for sealing the liquid crystal between the substrate 10 andthe substrate 20. Besides, the sealing member SLM plays a role of anadhesive member for bonding the substrate 10 and the substrate 20.

As shown in FIG. 3, in the case of the display apparatus DSP1, a throughhole TH1 that penetrates the substrate 10 and the substrate is formed inthe transparent region TRA. The through hole TH1 has a planar shapeformed along a shape (a circular shape in the case of FIG. 1) of thetransparent region TRA shown in FIG. 1. In an example shown in FIG. 3,the through hole TH1 penetrates each of the backlight unit BL, anoptical device OD1, the substrate 10, the substrate 20 and an opticaldevice OD2. The sealing member SLM is arranged between the liquidcrystal layer LQ and the through hole TH1. The sealing member SLM isarranged in the frame region FRA. Since the sealing member SLM isarranged in the frame region FRA, the liquid crystals of the liquidcrystal layer LQ can be prevented from leaking into the through holeTH1.

The display apparatus DSP1 includes the optical device OD1 and theoptical device OD2. The optical device OD1 is arranged between thesubstrate 10 and the backlight unit BL. The optical device OD2 isarranged in a region closer to the display surface of the substrate 20,in other words, is opposite to the substrate 10 across the substrate 20.Each of the optical device OD1 and the optical device OD2 includes atleast a polarizer, and may include a retardation film if needed. Asshown in FIG. 3, in the transparent region TRA, the optical devices OD1and OD2 that can be obstructive factors for transparency are not formed.More specifically, each of the optical devices OD1 and OD2 has anopening (the through hole TH1) that is formed at a position overlappingthe transparent region TRA so as to extend along the shape of thetransparent region TRA.

The display apparatus DSP1 includes a cover member CVM (see FIG. 2) thatcovers the region closer to the display surface of the substrate 20. Thecover member CVM faces the front surface (plane) 10 f opposite to theback surface (plane) 20 b of the substrate 20. In other words, the covermember CVM faces the front surface (plane) 20 f opposite to the backsurface (plane) 20 b of the substrate 20. The substrate 20 is betweenthe cover member CVM and the substrate 10 in the Z direction. The covermember CVM is a protective member that protects the substrates 10 and 20and the optical device OD2, and is arranged in the region closer to thedisplay surface of the display apparatus DSP1. However, as amodification example of the present embodiment, a case without the covermember CVM is exemplified in some cases. As shown in FIG. 3, in thepresent embodiment, the through hole TH1 is not formed at a position ofthe cover member CVM, the position overlapping the transparent regionTRA. In other words, the camera CAM inserted in the through hole TH1 iscovered with the cover member CVM.

Each of the substrate 10 and the substrate 20 is a transparent platehaving visible-light transmittable property (that is characteristics forallowing the visible light to penetrate). As the substrate that is thetransparent plate, a glass substrate can be exemplified. As aconstituent material of each of the substrate 10 and the substrate 20, aresin material (visible-light transmittable resin material) containing apolymer such as polyimide, polyamide, polycarbonate, polyester or otherscan be also used. In the case of the substrate made of the resinmaterial such as polyimide, the substrate has flexibility. When thesubstrate 10 has flexibility, a part (such as the peripheral region PFA)of the substrate 10 can be curved or bent. When the substrate 10 and thesubstrate 20 have flexibility, the area of the peripheral region PFA ina planar view can be reduced. In this case, the occupancy of theeffective display region in a planar view can be increased.

As shown in FIG. 4, a plurality of pixels PX are arranged in the displayregion DA. In the example shown in FIG. 4, each of the plurality ofpixels PX has a plurality of subpixels PXs. The plurality of subpixelsPXs include subpixels PXs for, for example, red, blue and green. Bycontrol for a color tone of the plurality of subpixels PXs, a colorimage can be displayed. The number of types of the subpixels PXsconfiguring one pixel PX is not only three exemplified in FIG. 4, andvarious modification examples are applicable.

Each of the plurality of subpixels PXs includes a transistor Tr1 that isa switching element for controlling the turning ON/OFF of the electricfield applied on the liquid crystal layer LQ. The transistor Tr1controls an operation of the subpixel PXs. As described later, thetransistor Tr1 is a thin film transistor (TFT) that is formed on thesubstrate 10.

As shown in FIG. 4, the display apparatus DSP1 includes a plurality ofscan signal lines GL extending in an X direction in the display regionDA and a plurality of image signal lines SL extending in a Y directionthat crosses (in FIG. 4, that is orthogonal to) the X direction in thedisplay region DA. The scan signal line GL is a gate line that isconnected to a gate of the transistor Tr1. The image signal line SL is asource line that is connected to a source of the transistor Tr1. Each ofthe plurality of scan signal lines GL extends in the X direction, and isarrayed to insert, for example, an equal interval therebetween in the Ydirection. Each of the plurality of image signal lines SL extends in theY direction, and is arrayed to insert, for example, an equal intervaltherebetween in the X direction.

Each of the plurality of scan signal lines GL is connected to a scandriving circuit (gate driving circuit) GD. A scan signal Gsi that isoutput from the scan driving circuit GD is input to the gate of thetransistor Tr1 through the scan signal line GL. Each of the plurality ofimage signal lines SL is connected to an image-signal driving circuitSD. An image signal Spic that is output from the image-signal drivingcircuit SD is input to the source of the transistor Tr1 through theimage signal line SL.

Each of the plurality of image signal lines SL is connected to a pixelelectrode PE through the transistor Tr1. More specifically, the imagesignal line SL is connected to the source of the transistor Tr1, and thepixel electrode PE is connected to a drain of the transistor Tr1. Whenthe transistor Tr1 is being turned ON, the image signal Spic is suppliedfrom the image signal line SL to the pixel electrode PE. The pixelelectrode PE is connected to a common electrode CE through a dielectriclayer (a capacitance element CS shown in FIG. 4). To the electrode CEfunctioning as the common electrode, a fixed potential is supplied froma common-potential supplying circuit CD in a display period where theimage is displayed in the display region DA. The fixed potential that issupplied to the electrode CE is a common potential among the pluralityof subpixels PXs. In the display period, the electric field is formed ineach subpixel PXs in accordance with a potential difference between thepotential that is supplied to the electrode CE and the potential that issupplied to the pixel electrode PE, and liquid crystal moleculescontained in the liquid crystal layer LQ are driven by this electricfield.

Each of the scan driving circuit GD, the image-signal driving circuit SDand the common-potential supplying circuit CD shown in FIG. 4 is formedin the peripheral region PFA shown in FIG. 1 or a wiring board FWB1connected to the peripheral region PFA. As shown in FIG. 2, one end ofthe wiring board FWB1 is connected to a terminal TM1 that is formed tobe closer to the front surface 10 f of the substrate 10. The other endof the wiring board FWB1 is arranged to be closer to the back surface 10b of the substrate 10. The wiring board FWB1 is connected to a circuitboard CB1.

As shown in FIG. 5, a plurality of conductive layers CL1 to CL5, aplurality of insulating films 11 to 16 and an alignment film AL1 areformed between the substrate 10 and the liquid crystal layer LQ. Theplurality of conductive layers CL1 to CL5, the plurality of insulatingfilms 11 to 16 and the alignment film AL1 are formed on the frontsurface 10 f of the substrate 10. The light-blocking film BM, the colorfilters CFR, CFG and CFB, the insulating film OC1 and an alignment filmAL2 are formed between the substrate 20 and the liquid crystal layer LQ.The light-blocking film BM, the color filters CFR, CFG and CFB, theinsulating film OC1 and the alignment film AL2 are formed on the backsurface 20 b of the substrate 20.

In each of the conductive layers CL1, CL2 and CL3 shown in FIG. 5, ametallic conductor pattern (metallic wiring) is formed. Each of theconductive layer CL1 and the conductive layer CL3 includes a metallicfilm made of, for example, a metal such as molybdenum (Mo) or tungsten(W) or an alloy of such a metal. The conductor pattern of the conductivelayer CL2 includes a metallic film having, for example, a multilayerstructure such as a layered film made of an aluminum (Al) filmsandwiched by a titanium (Ti) film, a titanium nitride (TiN) film orothers. Each of the conductive layer CL4 and the conductive layer CL5mainly includes a conductive oxide material (transparent conductivematerial) such as ITO (Indium Tin Oxide), IZO (Indium Zinc Oxide) orothers. In the present specification, a conductive film that is made ofa material having visible-light transmittance and conductivity such asITO and IZO is called a transparent conductive film.

An insulating film intervenes between the conductive layers CL1 to CL5,respectively. An insulating film 11 and an insulating film 12 intervenebetween the conductive layer CL1 and the substrate 10. An insulatingfilm 13 intervenes between the conductive layer CL1 and the conductivelayer CL2. An insulating film 14 intervenes between the conductive layerCL3 and the conductive layer CL4. An insulating film 15 intervenesbetween the conductive layer CL4 and the conductive layer CL5. Thealignment film AL1 intervenes between the conductive layer CL5 and theliquid crystal layer LQ. Each of the insulating films 11, 12, 13 and 16is an inorganic insulating film. As the inorganic insulating film, forexample, a silicon nitride (SiN) film, a silicon oxide (SiO) film, analuminum oxide (AlOx) film or a layered film made of such films can beexemplified. Each of the insulating film 14 and the insulating film 15is an organic insulating film. When an insulating film made of anorganic material is formed to be thicker than an insulating film made ofan inorganic material, an upper surface (front surface) can beplanarized. Each of the insulating film 14 and the insulating film 15 isused as a planarizing film for planarizing surface unevenness of theconductor pattern formed in a lower layer. Therefore, a thickness ofeach of the insulating film 14 and the insulating film 15 is larger thanthat of each of the insulating films 11, 12 and 13 that are theinorganic insulating films. As an example of the organic insulatingfilms, an acrylic-based light-sensitive resin or others can beexemplified.

Each of the plurality of scan signal lines GL is formed in theconductive layer CL1 above the substrate 10. The insulating film 11 andthe insulating film 12 are layered on the substrate 10, and the scansignal line GL is formed on the insulating film 12. Each of theplurality of image signal lines SL is formed in the conductive layer CL2above the substrate 10. The insulating films 11, 12 and 13 are layeredon the substrate 10, and the image scan signal line SL is formed on theinsulating film 13.

A semiconductor layer of the transistor (transistor element) Tr1 shownin FIG. 3 is formed between the insulating film 11 and the insulatingfilm 12. Since the semiconductor layer is on a cross section that isdifferent from FIG. 4, the semiconductor layer is not illustrated inFIG. 4. A source region of the semiconductor layer is electricallyconnected to the image signal line SL formed in the conductive layerCL2. A drain region of the semiconductor layer is electrically connectedto the pixel electrode PE formed in the conductive layer CL5. In aplanar view, the scan signal line GL extends in a gap between the sourceregion and the drain region of the semiconductor layer. The scan signalline GL overlaps a channel region of the semiconductor layer, andfunctions as the gate electrode of the transistor Tr1. The insulatingfilm 12 that intervenes between the channel region and the scan signalline GL functions as a gate insulating film. As seen in the exampledescribed above, a TFT that is structured so that the gate electrode isarranged on an upper side of the channel region of the transistor Tr1 iscalled top gate mode. However, there are various modification examplesof the TFT mode. For example, a bottom gate mode in which the gateelectrode is arranged on a lower side of the channel region may be used.Alternatively, a mode in which the gate electrode is arranged on boththe upper and lower sides of the channel region is also exemplified.

A wiring MW3 is arranged in the conductive layer CL3. The wiring MW3 isa metallic wiring made of a metal as similar to the scan signal line GLand the image signal line SL. The wiring MW3 is arranged at a positionoverlapping the image signal line SL in the thickness direction (Zdirection). The wiring MW3 is electrically connected to the electrode CEthat is formed in the conductive layer CL4. In this case, the wiring MW3can be used as a wiring for supplying a potential to the electrode CE.As described later, in the display apparatus DSP1 functioning as a touchpanel, the electrode CE is used as a detection electrode detecting aninput position (touch position) by using change in an electrostaticcapacitance. The wiring MW3 electrically connects the detection circuitand the electrode CE for use in the detection of the input position. Inthis case, the wiring MW3 is used as a signal transmission passage inwhich a driving signal or a detection signal for use in the detection ofthe touch position is transmitted.

The conductive layer CL4 includes a visible-light transmittabletransparent conductive film TCF1 and is arranged between the substrate10 and the substrate 20. In the conductive layer CL4, the electrode CEis formed. A plurality of transparent conductive films TCF1 formed inthe conductive layer CL4 include the electrode CE. The electrode CE isformed on the insulating film 15 that is the planarizing film. FIG. 4shows one electrode CE. However, in the display region DA shown in FIG.1, a plurality of electrodes CE may be arranged so as to separate fromone another. And, as described above, to the electrode CE, the commonpotential among the plurality of subpixels PXs is supplied. Therefore,as shown in FIG. 4, the electrode CE may be formed allover the pluralityof subpixels PXs. In the present embodiment, the electrode CE is used asthe detection electrode for use in the detection of the input positionas described later. Therefore, in the display region DA shown in FIG. 1,a plurality of electrodes CE are arranged so as to separate from oneanother. A layout of the electrodes CE in a planar view will bedescribed in detail later.

The conductive layer CL5 includes the visible-light transmittabletransparent conductive films TCF2 and is arranged between the conductivelayer CL4 and the substrate 20. In the conductive layer CL5, a pluralityof pixel electrodes PE are formed. The plurality of transparentconductive films TCF2 formed in the conductive layer CL5 include aplurality of pixel electrodes PE. The insulating film 16 that is theinorganic insulating film intervenes between the conductive layer CL5where the pixel electrode PE is formed and the conductive layer CL4where the electrode CE is formed. This insulating film 16 functions asthe dielectric layer to form the capacitance element CS shown in FIG. 3.

The plurality of pixel electrodes PE are covered with the alignment filmAL1. The alignment film AL1 is the organic insulating film having afunction of unifying initial alignments of liquid crystal moleculescontained in the liquid crystal layer LO, and is made of, for example, apolyimide resin. The alignment film AL1 is in contact with the liquidcrystal layer LQ.

As shown in FIG. 4, a light-blocking film BM, color filters CFR, CFG andCFB, an insulating film OC1 and an alignment film AL2 are formed on theback surface (main surface, plane) 20 b of the substrate 20.

The color filters CFR, CFG and CFB are formed in a region closer to theback surface 20 b that faces the substrate 10. In the example shown inFIG. 3, the color filters CFR, CFG and CFB of three colors that are red(R), green (G) and blue (B) are periodically arranged. In the colordisplay apparatus, a color image is displayed by grouping, for example,the three-color pixels of the red (R), the green (G) and the blue (B)into one set. The plurality of color filters CFR, CFG and CFB of thesubstrate 20 are arranged at positions facing the respective pixels PX(see FIG. 1) having the respective pixel electrodes PE formed in thesubstrate 10. Note that types of the color filters are not limited tothe three colors that are the red (R), the green (G) and the blue (B).

The light-blocking film BM is arranged on boundaries among the colorfilters CFR, CFG and CFB of the respective colors. The light-blockingfilm BM is called black matrix, and is made of, for example, a blackresin or a low-reflective metal. The light-blocking film BM in thedisplay region DA is formed to have, for example, a grid form in aplanar view. In other words, the light-blocking film BM extends in the Xand the Y directions. More specifically, the light-blocking film BM hasa plurality of portions extending in the Y direction and a plurality ofportions extending in the X direction crossing the Y direction. Eachpixel PX is partitioned by the black matrix, so that light leakage andcolor mixture can be suppressed.

In the display region DA, the light-blocking film BM overlaps the scansignal line GL, the image signal line SL and the wiring MW3 that are themetal wirings. Since the metal wiring having the light-blocking propertyis arranged at the position overlapping the light-blocking film BM, themetal wiring is difficult to be visually recognized on the displayscreen. On the other hand, at least a part of each of the electrode CEand the pixel electrode PE is arranged at a position not overlapping thelight-blocking film BM. Each of the electrode CE and the pixel electrodePX is made of a visible-light transmittable conductive material.Therefore, even when each of the electrode CE and the pixel electrode PEis arranged at the position not overlapping the light-blocking film BM,the visible light is not blocked at each subpixel PXs by the electrodeCE and the pixel electrode PE.

The light-blocking film BM is also formed in the peripheral region PFA(see FIG. 1) of the substrate 20. The peripheral region PFA overlaps thelight-blocking film BM. The display region DA is defined as an innerregion of the peripheral region PFA. The peripheral region PFA is aregion overlapping the light-blocking film BM that blocks the light thatis emitted from the backlight unit (light source) BL shown in FIG. 2.While the light-blocking film BM is also formed inside the displayregion DA, the light-blocking film BM in the display region DA is formedto have a plurality of openings. Generally, among the openings which areformed in the light-blocking film BM and from which the color filtersare exposed, an end of an opening that is formed in the closest regionto an edge is defined as the boundary between the display region DA andthe peripheral region PFA. Also, as schematically shown in FIG. 3, thetransparent region TRA does not overlap the light block film BM whilethe frame region FRA overlaps the light block film BM. In this case,even when the metal wiring is arranged to have a narrow pitchtherebetween in the frame region FRA, optical influence of the metalwiring in the frame region FRA can be reduced.

The insulating film OC1 shown in FIG. 5 covers the color filters CFR,CFG and CFB. The insulating film OC1 functions as a protective film thatprevents impurities from spreading from the color filters to the liquidcrystal layer. The insulating film OC1 is an organic insulating filmmade of, for example, an acrylic-based light-sensitive resin or others.

The insulating film OC1 is covered with the alignment film AL2. Thealignment film AL2 is an organic insulating film having a function ofunifying the initial alignments of the liquid crystal moleculescontained in the liquid crystal layer LQ, and is made of, for example, apolyimide resin. The alignment film AL2 is in contact with the liquidcrystal layer LQ.

<Touch Panel Function>

Next, a touch panel function included in the display apparatus DSP1 ofthe present embodiment will be explained. FIG. 6 is a plan view showinga layout example of a common electrode (detection electrode) included inthe display apparatus shown in FIG. 1.

The display apparatus DSP1 is a display apparatus with a sensor havingthe touch panel function for use in the detection of the input positionby using the change in the electrostatic capacitance in a sensor regionoverlapping the display region DA. The display region DA shown in FIG. 1includes the sensor region functioning as a detection device having thetouch panel function for use in the detection of the change in theelectrostatic capacitance. As shown in FIG. 6, the display apparatusDSP1 includes a plurality of electrodes CE that separate from oneanother. In the display region DA, the plurality of electrodes CE arearranged in a matrix form in the X direction and the Y direction. Eachof the electrodes CE is schematically illustrated to be rectangular or asquare in a planar view. The electrode CE is made of, for example, theconductive material such as ITO having the visible-light transmittanceas described above.

In a region closer to a shorter side of the peripheral region PFA, aconnection circuit MP is arranged. The wiring board FWB1 is connected tothe region closer to the shorter side of the peripheral region PFA, anda detection circuit (detection control circuit) DP for controlling thetouch panel function is arranged in the wiring board FWB1. Theconnection circuit MP and the detection circuit DP are electricallyconnected to each other through the wiring board FWB1. The arrangementof the connection circuit MP and the detection circuit DP is not limitedto the example shown in FIG. 6, and the connection circuit MP and thedetection circuit DP may be arranged on, for example, the substrate 10of the display apparatus DSP1. Alternatively, the connection circuit MPand the detection circuit DP may be arranged on the control substrateoutside the module or the wiring board FWB1.

The electrode CE is electrically connected to the detection circuit DPthrough the wiring MW3 and the connection circuit MP. The wiring MW3supplies the driving signal to be supplied to the electrode CE totransmit a signal depending on the change in the electrostaticcapacitance to an analog front end. The plurality of wirings MW3 areelectrically connected to the plurality of electrodes CE arranged in thedisplay region DA, respectively, and are led out to reach the peripheralregion PFA. Each of the plurality of wirings MW3 extends in the Ydirection, and the plurality of wirings MW3 are lined in the Xdirection. For example, the driving circuit included in the detectioncircuit DP is connected to each of the plurality of electrodes CEthrough the wiring MW3 and the connection circuit MP arranged in theperipheral region PFA.

The detection circuit DP includes a circuit for supplying the drivingsignal for use in the detection of the change in the electrostaticcapacitance in a detection period where the touch panel function of thedisplay apparatus DSP1 operates and a circuit for receiving thedetection signal output from the electrode CE. The connection circuit MPis arranged between the electrode CE and the detection circuit DP. Theconnection circuit MP is a circuit for switching the connection and thedisconnection between the detection circuit DP and the electrode CE thatis a target for the detection, on the basis of the control signalsupplied from the detection circuit DP. The connection circuit MPincludes the analog front end. And, the connection circuit MP may be abuilt-in circuit on the substrate 10 or a driver IC mounted on thesubstrate 10.

In the insulating film 15 shown in FIG. 5, an opening (contact hole) notillustrated is formed at a position at which the electrode CE and thewiring MW3 overlap each other, and the electrode CE and the wiring MW3are electrically connected to each other through this opening. In theexample shown in FIG. 6, one wiring MW3 and one electrode CE areelectrically connected to each other. However, one electrode CE may beelectrically connected to the plurality of wirings MW3. In this case, abundle of the plurality of wirings MW3 that are connected to oneelectrode CE forms a transmission passage for the detection signal andthe driving signal for use in the touch detection.

In the display apparatus DSP1, a display period in which the liquidcrystal layer LQ (see FIG. 2) is driven to display the image and adetection period in which the electrode CE is driven to detect the inputposition are alternately repeated. In the electrode CE in the displayperiod, a common potential is supplied to the plurality of pixels inorder to form an electric field for driving the liquid crystal layer LQ.In other words, in the display period, the electrode CE functions as acommon electrode. In the detection period, the driving signal for use inthe detection of the input position is supplied from the detectioncircuit DP and is input to the electrode CE. In other words, in thedetection period, the electrode CE functions as a driving electrode foruse in the detection of the input position in the sensor region. And, inthe detection period, the electrode CE outputs the detection signalcorresponding to the input driving signal. In other words, in thedetection period, the electrode CE functions as a detection electrodefor use in the detection of the input position in the sensor region.

The detection signal from the electrode CE is changed by the influenceof the electrostatic capacitance around the electrode CE. When an inputtool such as a finger approaches the vicinity of one electrode CE of theplurality of electrodes CE, the electrostatic capacitance around theelectrode CE is changed by the influence of the input tool. In thiscase, a detection signal that is output from an electrode CE near theinput tool is different in a waveform from a detection signal that isoutput from a different electrode CE. The detection circuit DP receivesthe respective detection signals that are supplied from the plurality ofelectrodes CE, and identifies the input position on the basis of thesedetection signals.

The electrode CE of the present embodiment has the function serving asthe driving electrode to which the driving signal is supplied and thefunction serving as the detection electrode which outputs the detectionsignal. However, as a modification example, the driving electrode andthe detection electrode may be separately prepared. For example, whenthe electrode CE is used as the driving electrode, the detectionelectrode may be prepared to separate from the electrode CE.

<Peripheral Structure of Transparent Region>

Next, a peripheral structure of the transparent region TRA shown in FIG.6 will be explained. FIG. 7 is an enlarged plan view showing a layout ofthe transparent conductive film arranged in the transparent region ofFIG. 6. Although FIG. 7 is a plan view, the transparent conductive filmTCF2 is added with a dot pattern in order to define an outline of thetransparent conductive film TCF2. FIG. 8 is an enlarged cross-sectionalview taken along a line A-A of FIG. 7.

In the display apparatus DSP1 of the present embodiment, the transparentregion TRA exists inside the display region DA in a planar view as shownin FIG. 6. Since the through hole TH1 exists in the transparent regionTRA as shown in FIG. 3, the electrode CE shown in FIG. 6 is not formedin the transparent region TRA. However, when the through hole TH1 isformed as seen in the display apparatus DSP1, it has been found that amember arranged in periphery (such as the frame region FRA) of thethrough hole TH1 is easily electrically charged, so that the electricalcharge becomes a source of noises at the time of the image displayoperation and the touch detection operation. For example, as shown inFIG. 8, the plurality of scan signal lines GL and the plurality of imagesignal lines SL are densely arranged in the frame region FRA. When theelectrical charge charged on the member in the frame region FRA affectsthese signal transmission passages, the electrical charge becomes thenoises for the image display operation. And, the plurality of electrodesCE are arranged in the periphery of the through hole TH1. When theelectrical charge affects the driving signal supplied to the electrodeCE and the detection signal output from the electrode CE affects at thetime of the touch detection operation, the electrical charge becomes thenoises for the touch detection. In order to stabilize the operations ofthe display apparatus DSP1, it is necessary to suppress the electricalcharge on the member in the periphery of the through hole TH1.

As shown in FIG. 7, the display apparatus DSP1 includes the transparentconductive film TCF2 arranged in the frame region FRA in a planar view.In the display region DA of the display apparatus DSP1, in theconductive layer CL4 shown in FIG. 5, a plurality of transparentconductive films TCF1 including the plurality of electrodes CE areformed. In the conductive layer CL5, a plurality of transparentconductive films TCF2 including the pixel electrode PE are formed. Inthe frame region FRA, the transparent conductive film TCF2 of theconductive layer CL5 is formed.

As shown in FIG. 8, a width of the transparent conductive film TCF2arranged in the frame region FRA is larger than each width of the imagesignal line SL and the scan signal line GL arranged in the frame regionFRA. And, an area of the transparent conductive film TCF2 arranged inthe frame region FRA is larger than each area of the image signal lineSL and the scan signal line GL arranged in the frame region FRA. Theelectrical charge on the member in the periphery of the through hole TH1occurs at the time of, for example, the manufacturing process of thedisplay apparatus DSP1. Since the through hole TH1 is hollowed, thestatic electricity occurring at the time of the manufacturing processeasily stays in the vicinity of the through hole TH1. When theconductive pattern having the large area is arranged in the vicinity ofthe through hole TH1 as seen in the display apparatus DSP1, theelectrical charge occurring at the time of the manufacturing processtends to gather in the conductive pattern having the large area, inother words, the transparent conductive film TCF2. When the transparentconductive film TCF2 is arranged in the frame region FRA, the electricalcharge can be extracted outward through this transparent conductivefilm. In other words, when the transparent conductive film TCF2 isarranged in the frame region FRA, the transparent conductive film TCF2can be used as an antistatic film.

As a modification example of the antistatic film, note that a method ofarranging the transparent conductive film TCF1 in the frame region FRAis also exemplified. For example, the electrode CE that is thetransparent conductive film TCF1 shown in FIG. 8 may extend to aposition overlapping the plurality of image signal lines SL of the frameregion FRA. In this case, even if the transparent conductive film TCF2shown in FIG. 8 is not arranged, the electrical charge charged on thetransparent conductive film TCF1 can be accumulated and dischargedoutward. However, in the present embodiment, the electrode CE is notarranged in much of the frame region FRA. The transparent conductivefilm TCF2 is arranged so as to cover the much (such as 70% or more) ofthe frame region FRA. The electrode CE is arranged in the periphery ofthe boundary between the frame region FRA and the display region DA, andis electrically connected to the transparent conductive film TCF2 in aregion in the periphery of this boundary. A reason for this will bedescribed later.

In order to improve the antistatic effect of the transparent conductivefilm TCF2 arranged in the frame region FRA, it is preferable to connectthe transparent conductive film TCF2 arranged in the frame region FRA toan electrical conductive passage. If the transparent conductive filmTCF2 arranged in the frame region FRA is connected to the electricalconductive passage, the electrical charge is extracted outward throughthe electrical conductive passage, and therefore, the frame region FRAis difficult to be electrically charged. In the present embodiment, thetransparent conductive film TCF2 in the frame region FRA is electricallyconnected to a part of each of the plurality of electrodes CE.Therefore, the electrical charge occurring in the frame region FRA atthe time of the manufacturing process of the display apparatus DSP1 canbe easily extracted out of the display apparatus DSP1 through the wiringMW3 connected to the electrode CE shown in FIG. 6.

The following effect can be obtained by the electrical connectionbetween the electrode CE and the transparent conductive film TCF2 in theframe region FRA. In other words, electrical characteristics of anelectrode CE2 arranged in the periphery of the transparent region TRAcan be made close to electrical characteristics of an electrode CE3 atthe position far from the transparent region TRA. As shown in FIG. 7,the plurality of electrodes CE include the electrode CE2 connected tothe transparent conductive film TCF2 in the frame region FRA and theelectrode CE3 that is at the position far from the frame region FRA andthat is not connected to the transparent conductive film TCF2 in theframe region FRA.

In the present embodiment, since the through hole TH1 is formed in thetransparent region TRA, the electrode CE2 cannot be arranged at theposition overlapping the through hole TH1. In the example shown in FIG.8, an area of the electrode CE2 is smaller than an area of the electrodeCE3. When the electrode CE is used as the detection electrode (sensor)for use in the detection of the input position as described above, theareas of the plurality of electrodes CE are preferably equal to oneanother in a viewpoint of unifying the electrical characteristics forthe sensor. Even if the areas of the plurality of electrodes CE aredifferent from one another, an area ratio of the other electrode CE toone electrode CE is preferably within 75% to 125%.

In the display apparatus DSP1, each of the plurality of electrodes CE2is electrically connected to the transparent conductive film TCF2. Thetransparent conductive film TCF2 in the frame region FRA is divided intoa plurality of portions, and the plurality of portions are connected tothe different electrodes CE2. In this case, at the time of the touchdetection operation, the transparent conductive film TCF2 connected tothe electrode CE2 functions as a part of the detection electrode.Therefore, in consideration of the electrical characteristics of theelectrode CE2, the area of the transparent conductive film TCF2connected to the electrode CE2 can be regarded as a part of the area ofthe detection electrode. Note that a total of the area of the electrodeCE2 and the area of the transparent conductive film TCF2 connected tothe electrode CE2 is different from the area of the electrode CE3.However, by the electrical connection between the electrode CE2 and thetransparent conductive film TCF2, the area ratio of the electrode CE2 tothe electrode CE3 can be adjusted so as to be close to 100%. As aresult, the detection accuracy in the vicinity of the transparent regionTRA can be improved.

The electrode CE that is electrically connected to the transparentconductive film TCF2 in the frame region FRA is used as the commonelectrode in the display period. Therefore, at least in the displayperiod, a fixed potential is supplied to the transparent conductive filmTCF2 through the electrode CE. Even if the transparent conductive filmTCF2 is electrically charged, the electrical charge can be canceled bythe supply of the fixed potential to the transparent conductive filmTCF2. Therefore, even if the static electricity is caused after thecompletion of the display apparatus DSP1 by, for example, the workingsuch as the attachment/detachment of the camera CAM shown in FIG. 3, theelectrical charge resulting from the static electricity can be canceledby the supply of the fixed potential to the transparent conductive filmTCF2. In the present embodiment, the example of the supply of the fixedpotential to the transparent conductive film TCF2 through the electrodeCE has been explained. However, the method of the supply of the fixedpotential to the transparent conductive film TCF2 is not limited to thesupply of the same through the electrode CE. If the fixed potential issupplied to the charged transparent conductive film TCF2 in some way,the electrical charge can be canceled.

The electrode CE2 and the transparent conductive film TCF2 areelectrically connected to each other through a contact hole CH1 formedin the frame region FRA. More specifically, the insulating film 16includes the contact hole CH1 that is an opening at a positionoverlapping the electrode CE2. The electrode CE2 in the contact hole CH1is exposed from the insulating film 16. The transparent conductive filmTCF2 is buried in the contact hole CH1, and the electrode CE2 and thetransparent conductive film TCF2 are connected to each other at a basesurface of the contact hole CH1. FIG. 8 illustrates one contact holeCH1. However, the electrode CE2 and the transparent conductive film TCF2are electrically connected to each other through a plurality of contactholes CH1. This manner forms a plurality of passages that electricallyconnect electrode CE2 and the transparent conductive film TCF2, andtherefore, the electrical characteristics of, for example, the electrodeCE functioning as the detection electrode can be stabilized.

As shown in FIG. 8, the contact holes CH1 do not overlap the pluralityof image signal lines SL and the plurality of scan signal lines GL. Whenthe contact holes CH1 are arranged at the positions not overlapping theplurality of image signal lines SL and the plurality of scan signallines GL, the parasitic capacitances of the contact holes CH1 can besuppressed from affecting the image signal lines SL and the scan signallines GL. Therefore, a degree of freedom for the layout of the imagesignal lines SL and the scan signal lines GL in the frame region FRA canbe improved.

As shown in FIG. 8, the sealing member SLM surrounding the through holeTH1 is arranged between the substrate 10 and the substrate 20 in theframe region FRA. The sealing member SLM is an adhesive for fixedlybonding the substrate 10 and the substrate 20. The sealing member SLM ismade of the same material as that of the sealing member SLM arranged inthe peripheral region PFA shown in FIG. 1, and has a function ofsuppressing the leakage of the liquid crystal layer LQ to the outside ofthe display region DA. In order to improve the sealing performance ofthe sealing member SLM, it is preferable to increase the strength ofeach member arranged between the sealing member SLM and the substrate10. In case with the formation of the through hole TH1 in the vicinityof the frame region FRA as seen in the display apparatus DSP1, thestress on each member in the frame region FRA is larger than that in acase without the through hole TH1, as described later in a modificationexample. Therefore, the strength of each member in the frame region FRAis preferably large.

In this case, in accordance with the material of the alignment film AL1,the alignment film AL1 has low bonding strength with the insulating film16 that is a base film in some cases. In this case, when the transparentconductive film TCF2 is arranged between the alignment film AL1 and theinsulating film 16, the bonding strength between the alignment film AL1and the insulating film 16 is improved. Therefore, in order to improvethe strength of the frame region FRA, it is preferable to arrange thetransparent conductive film TCF2 in the frame region FRA.

Second Embodiment

In the first embodiment, the display apparatus DSP1 having the throughhole TH1 formed in the transparent region TRA as shown in FIGS. 3 and 8has been explained. In a second embodiment, a configuration example of adisplay apparatus not having the through hole TH1 in the transparentregion TRA will be explained. In the present embodiment, whiledifferences from the first embodiment will be mainly explained, therepetitive explanation for the same structures as those of the displayapparatus DSP1 explained in the first embodiment will be omitted inprinciple. The explanation will be made with reference to thealready-explained FIGS. 1 to 8 if needed.

FIG. 9 is an enlarged cross-sectional view of a display apparatusaccording to a modification example of the display apparatus shown inFIG. 3. FIG. 10 is an enlarged plan view showing a layout of atransparent conductive film arranged in a transparent region of thedisplay apparatus shown in FIG. 9. FIG. 10 corresponds to FIG. 7. FIG.11 is an enlarged cross-sectional view taken along a line A-A of FIG.10.

The display apparatus DSP2 shown in FIG. 9 is different from the displayapparatus DSP1 shown in FIG. 3 in that the through hole TH1 is notformed in the transparent region TRA. In the display apparatus DSP1, thevisible-light transmittance of the transparent region TRA is achievedby, in the transparent region TRA, avoiding the arrangement of thetransistor Tr1 of the plurality of subpixels PXs and the light-blockingmembers such as the light-blocking layer BM and the conductive layersCL1, CL2 and CL3 that are the metal-made conductive layers but arrangingthe visible-light transmittable member. Therefore, the transparentregion TRA includes the substrate 10 and the substrate 20 facing eachother and the liquid crystal layer LQ arranged between the substrate 10and the substrate 20. The camera CAM is arranged so as to be close tothe back surface of the substrate 10.

In the display apparatus DSP2, the through hole TH1 (see FIG. 3) is notformed in the transparent region TRA, and therefore, the strength of theperiphery of the transparent region TRA is higher than that of thedisplay apparatus DSP1 shown in FIG. 3. In the display apparatus DSP2, amember such as the insulating films 11, 12, 13, 14, 15 and 16 and thetransparent conductive films TCF1 and TCF2 shown in FIG. 5 other thanthe substrate 10 and the substrate 20 can be arranged in the transparentregion TRA as long as the member has the visible-light transmittance.

As shown in FIG. 10, the transparent conductive film TCF2 is arranged inthe frame region FRA and the transparent region TRA in a planar view.The transparent conductive film TCF2 extends from the frame region FRAto the transparent region TRA. Each area of the plurality of transparentconductive films TCF2 in the frame region FRA and the transparent regionTRA of the display apparatus DSP2 is larger than each area of theplurality of transparent conductive films TCF2 in the frame region FRAof the display apparatus DSP1 shown in FIG. 7. The electrical chargeoccurring due to the static electricity is easily trapped by the largearea of the transparent conductive film TCF2, and therefore, theantistatic characteristics can be improved.

The transparent conductive film TCF2 in the frame region FRA and thetransparent region TRA of the display apparatus DSP2 is divided into aplurality of portions, and the plurality of portions are connected tothe different electrodes CE2. The electrode CE including the pluralityof electrodes CE2 is an electrode that is electrically connected to thedetection circuit DP as similar to the plurality of electrodes CE of thedisplay apparatus DSP1 explained with reference to FIG. 6. Each of theplurality of electrodes CE is the transparent conductive film TCF1formed in the conductive layer CL4 shown in FIG. 5.

When the transparent conductive film TCF2 can be arranged in thetransparent region TRA as seen in the display apparatus DSP2, each areaof the plurality of transparent conductive films TCF2 can be made large.In this case, an area ratio between a total of the area of the electrodeCE2 and the area of the transparent conductive film TCF2 connected tothe electrode CE2 and the area of the electrode CE3 can be adjusted soas to be substantially nearly regarded as 100%. In the display apparatusDSP2, the accuracy of the detection of the input position in thetransparent region TRA and the peripheral region of the transparentregion can be improved to be better than that of the display apparatusDSP1 shown in FIG. 7.

As shown in FIG. 11, in the display apparatus DSP2, the transparentconductive film TCF1 including the electrode CE is not arranged in thetransparent region TRA. The electrode CE is not arranged in much of theframe region FRA. However, the electrode CE is arranged in the peripheryof the boundary between the frame region FRA and the display region DA,and is electrically connected to the transparent conductive film TCF2 inthe region in the periphery of this boundary. By the arrangement of thetransparent conductive film TCF2 between the insulating film 16 and thealignment film AL1 as described above, the alignment film AL1 in thetransparent region FRA is suppressed from being peeled off. The functionof the antistatic film can be sufficiently obtained by the arrangementof the transparent conductive film TCF2 in the transparent region TRA.Therefore, in the display apparatus DSP2, the transparent conductivefilm TCF2 is arranged in place of transparent conductive film TCF1 inthe transparent region TRA, so that the mechanical strength of thetransparent region TRA is improved. As a modification example of thedisplay apparatus DSP2, note that even the example of the arrangement ofonly the transparent conductive film TCF1 and the aspect of thearrangement of the transparent conductive films TCF1 and TCF2 in thetransparent region TRA can prevent or suppress the electrical charge inthe periphery of the transparent region.

As similar to the plurality of electrodes CE of the display apparatusDSP1 shown in FIG. 6, each of the plurality of electrodes CE of thedisplay apparatus DSP2 shown in FIG. 10 functions as the commonelectrode to which the fixed potential is supplied in the displayperiod. Therefore, even if the transparent conductive film TCF2 iselectrically charged after the completion of the display apparatus DSP2,the electrical charge can be canceled by the supply of the fixedpotential to the transparent conductive film TCF2.

The display apparatus DSP1 as shown in FIGS. 9 and 11 is different fromthe display apparatus DSP1 shown in FIG. 3 in that the liquid crystallayer LQ is arranged between the substrate 10 and the substrate 20 inthe transparent region TRA. More specifically, as shown in FIG. 11, thealignment film AL1 and the alignment film AL2 are arranged between thesubstrate 10 and the substrate 20, and the liquid crystal layer LQ isarranged between the alignment film AL1 and the alignment film AL2. Thealignment film AL1 covers the transparent conductive film TCF2 in thetransparent region TRA and the frame region FRA. The liquid crystalmolecules of the liquid crystal layer LQ are aligned in a mode of, forexample, transmitting the light in a state without application of theelectric field, that is so-called normally white mode. In this case,even if the transparent region TRA includes the liquid crystal layer LQ,the light transmittance can be secured.

Third Embodiment

A modification example of the display apparatus DSP2 explained in thesecond embodiment will be explained. FIG. 12 is an enlarged plan viewshowing a modification example of the display apparatus shown in FIG.10. FIG. 13 is an enlarged cross-sectional view taken along a line A-Aof FIG. 12. In the present embodiment, while differences from the secondembodiment will be mainly explained, the repetitive explanation for thesame structures as those of the display apparatus DSP1 explained in thefirst embodiment will be omitted in principle. The explanation will bemade with reference to the already-explained FIGS. 1 to 11 if needed.

A display apparatus DSP3 shown in FIG. 12 is different from the displayapparatus DSP1 shown in FIG. 10 in that single transparent conductivefilm TCF2 is arranged over the transparent region TRA and the frameregion FRA. A shape of the transparent conductive film TCF2 included inthe transparent region TRA and the frame region FRA of the displayapparatus DSP3 is, for example, circle. However, the shape is onlynecessary to be along a planar shape of the transparent region TRA and aplanar shape of the frame region FRA, and is not limited to the circle.In the example shown in FIG. 12, since the shape of the frame region FRAis a ring shape, the shape of the transparent conductive film TCF2 isthe circle.

In the transparent region TRA of the display apparatus DSP2 shown inFIG. 10, a slit SLT is formed between the plurality of transparentconductive films TCF2. The slit SLT is a portion where the transparentconductive film TCF2 is not formed. The transparent conductive film TCF2has the visible-light transmittance, and a portion where the transparentconductive film TCF2 is arranged and the slit SLT are different fromeach other in a refractive index for the visible light. Therefore, inorder to reduce the refraction of the visible light in the transparentregion TRA, it is preferable not to arrange the slit SLT in thetransparent region TRA.

In the transparent conductive film TCF2 of the display apparatus DSP3shown in FIG. 12, single transparent region TRA is formed so as tooverlap the entire transparent region TRA. In this case, the slit SLT(see FIG. 10) is not formed in the transparent region TRA, andtherefore, the visible-light transmittance of the transparent region TRAcan be improved to be better than that of the display apparatus DSP2shown in FIG. 10.

As shown in FIG. 13, the transparent conductive film TCF2 iselectrically connected to the wiring MW3 arranged in the conductivelayer CL3 through the contact hole CH1, the conductive pattern CP1 andthe contact hole CH2 in the frame region FRA. More specifically, theconductive pattern CP1 formed in the conductive layer CL4 is formed inthe frame region FRA. The conductive pattern CP1 is a pattern that isinserted in a passage electrically connecting the conductive layer CL5and the conductive layer CL3, and is made of, for example, thetransparent conductive film TCF1 as similar to the electrode CE. Theinsulating film 16 has a contact hole CH1 that is an opening at aposition overlapping the conductive pattern CP1. The transparentconductive film TCF2 is buried in the contact hole CH1, and theconductive pattern CP1 and the transparent conductive film TCF2 areconnected to each other at a base surface of the contact hole CH1. Theinsulating film 15 has a contact hole CH2 that is an opening at aposition overlapping the conductive pattern CP1 and a wiring MW3. Theconductive pattern CP1 is buried in the contact hole CH2, and theconductive pattern CP1 and the wiring MW3 are connected to each other ata base surface of the contact hole CH2.

As similar to the plurality of wirings MW3 of the display apparatus DSP1explained with reference to FIG. 6, the wiring MW3 is electricallyconnected to any of the plurality of electrodes CE. Therefore, in thedisplay period, a fixed potential is supplied to the transparentconductive film TCF2 shown in FIG. 13. Therefore, as similar to thedisplay apparatus DSP1 shown in FIG. 7 and the display apparatus DSP2shown in FIG. 10, even if the transparent conductive film TCF2 iselectrically charged after the completion of the display apparatus DSP3,the electrical charge can be canceled by the supply of the fixedpotential to the transparent conductive film TCF2.

A modification example of the display apparatus DSP3 is alsoconsiderable to have so-called floating conductive pattern in which thetransparent conductive film TCF2 shown in FIG. 12 is not electricallyconnected to another conductive pattern. Even if the transparentconductive film TCF2 is in the floating state, the transparentconductive film TCF2 can be used as the antistatic film by a process ofexternally removing the electrical charge charged at the time of theprocess of manufacturing the display apparatus DSP1. In order to easilycancel the electrical charge, as seen in the display apparatus DSP3, itis preferable to connect the transparent conductive film TCF2 to theconductive pattern that is connected to outside of the display apparatusDSP3. After the completion, it is particularly preferable to connect thetransparent conductive film TCF2 to a passage capable of supplying thefixed potential.

As shown in FIG. 12, the transparent conductive film TCF2 does notoverlap the electrode CE2 arranged in the periphery of the transparentconductive film TCF2 in a planar view. And, the transparent conductivefilm TCF2 and the electrode CE2 are not electrically connected to eachother. In this case, the transparent conductive film TCF2 does notcontribute to the increase in the area of the electrode CE functioningas the detection electrode to stabilize the detection accuracy.Therefore, in terms of the stabilization of the detection accuracy, thedisplay apparatus DSP1 shown in FIG. 7 and the display apparatus DSP2shown in FIG. 10 are more preferable.

Fourth Embodiment

Next, a modification example resulted from combination of the displayapparatus DSP1 explained in the first embodiment and the displayapparatus DSP3 explained in the third embodiment will be explained. FIG.14 is an enlarged plan view showing another modification example of thedisplay apparatus shown in FIG. 7. FIG. 15 is an enlargedcross-sectional view taken along a line A-A of FIG. 14. In the presentembodiment, while differences from the first and third embodiments willbe mainly explained, the repetitive explanation for the same structuresas those of the display apparatus DSP1 explained in the first embodimentwill be omitted in principle. The explanation will be made withreference to the already-explained FIGS. 1 to 13 if needed.

A transparent conductive film TCF2 of a display apparatus DSP4 shown inFIG. 14 is different in that the transparent conductive film includes aplurality of portions FP1 arranged in the frame region FRA and a portionFP2 arranged in the transparent region TRA but being far from theplurality of portions FP1. The display apparatus DSP4 includes atransparent conductive film TCF2 that is divided into a plurality ofpieces by the frame region FRA as similar to the display apparatus DSP1shown in FIG. 7. In this manner, the detection accuracy in the case ofthe usage of the plurality of electrodes CE2 as the detection electrodeis improved, and the antistatic characteristics of the transparentregion TRA is improved.

As similar to the display apparatus DSP1 shown in FIG. 6, the pluralityof electrodes CE that are connected to the detection circuit DP for usein the detection of the input position by using the change in theelectrostatic capacitance are arranged in the display region DA of thedisplay apparatus DSP4. As shown in FIG. 14, in a planar view, theplurality of electrodes CE include a plurality of electrodes CE2 thatare arranged so as to be adjacent to the frame region FRA and anelectrode CE3 that is far from the frame region FRA and that is notconnected to the portion FP1 of the transparent conductive film TCF2 inthe frame region FRA. The plurality of portions FP1 and the plurality ofelectrodes CE2 are electrically connected to each other, respectively.Note that the electrical connecting structure between the portion FP1and the electrode CE2 is the same as the connecting structure betweenthe transparent conductive film TCF2 and the electrode CE2 shown in FIG.8, and therefore, its illustration is omitted. The portion FP2 iselectrically insulated from the portion FP1, and is electricallyconnected to the electrode CE3 through the wiring MW3 shown with adotted line in FIG. 14.

The electrical connection structure between the portion FP2 and thewiring MW3 is shown in FIG. 15. As shown in FIG. 15, the portion FP2 ofthe transparent conductive film TCF2 is electrically connected to thewiring MW3 arranged in the conductive layer CL3 through the contact holeCH1, the conductive pattern CP1 and the contact hole CH2 arranged in theframe region FRA. In the example shown in FIG. 15, note that the contactholes CH1 and CH2 overlap the image signal line SL and the scan signalline GL. In order to reduce the parasitic capacitance on these signalwirings, it is preferable not to arrange the contact holes CH1 and CH2to overlap the image signal line SL and the scan signal line GL. Forexample, when a part of the portion FP1 shown in FIG. 14 is removed sothat a distance of the extension wiring extending from the portion FP2toward the display region DA increases, the positions of the contactholes CH1 and CH2 shown in FIG. 15 can be brought close to the boundarybetween the display region DA and the frame region FRA.

Fifth Embodiment

In the first embodiment, the aspect in the case of the total of the areaof the electrode CE2 and the area of the transparent conductive filmTCF2 connected to the electrode CE2 to be smaller than the area of theelectrode CE3 has been explained as shown in FIG. 7. In the fifthembodiment, a modification example in the case of the total of the areaof the electrode CE2 and the area of the transparent conductive filmTCF2 connected to the electrode CE2 to be larger than the area of theelectrode CE3 will be explained. In the present embodiment, whiledifferences from the first and third embodiments will be mainlyexplained, the repetitive explanation for the same structures as thoseof the display apparatus DSP1 explained in the first embodiment will beomitted in principle. The explanation will be made with reference to thealready-explained FIGS. 1 to 15 if needed.

FIG. 16 is an enlarged plan view of a display apparatus according toanother modification example of the display apparatus shown in FIG. 7.FIG. 17 is an enlarged plan view of a display apparatus according toanother modification example of the display apparatus shown in FIG. 12.The display apparatus DSP5 shown in FIG. 16 is different from thedisplay apparatus DSP1 shown in FIG. 7 in shapes of the electrode CE2and the transparent conductive film TCF2 connected to the electrode CE2.The display apparatus DSP6 shown in FIG. 17 is different from thedisplay apparatus DSP3 shown in FIG. 12 in the shape of the electrodeCE2.

Each electrode CE2 of the display apparatuses DSP5 and DSP6 is differentfrom each electrode CE2 of the display apparatus DSP1 shown in FIG. 7and the display apparatus DSP3 shown in FIG. 12 in that the area of theelectrode CE2 adjacent to the frame region FRA is larger than the areaof the electrode CE3 that is positioned to be far from the frame regionFRA (in other words, there is a different electrode CE2 between theelectrode CE2 and the frame region FRA). The electrode CE2 of thedisplay apparatus DSP5 is structured so that the adjacent two electrodesCE2 of the four electrodes CE2 shown in FIG. 7 are uniformed. Theelectrode CE2 of the display apparatus DSP6 is structured so that theadjacent two electrodes CE2 of the four electrodes CE2 shown in FIG. 12are uniformed.

The total of the area of the electrode CE2 and the area of thetransparent conductive film TCF2 connected to the electrode CE2 islarger than the area of the electrode CE3. As described above, when theareas of the plurality of electrodes CE are different from one another,an area ratio of the other electrode CE to one electrode CE ispreferably within 75% to 125%. The case of the area of the electrode CE2to be smaller than the area of the electrode CE3 as seen in the displayapparatus DSP1 in FIG. 7 or the case of the area of the electrode CE2 tobe larger than the area of the electrode CE3 as seen in the displayapparatus DSP5 in FIG. 8, whichever area ratio of the electrode CE2 andthe electrode CE3 is closer to 100%, can be selected.

In the case of the display apparatus DSP6 shown in FIG. 17, the area ofthe electrode CE2 is larger than the area of the electrode CE3, and theelectrode CE2 is not connected to the transparent conductive film TCF2arranged in the transparent region TRA and the frame region FRA. Thiscase can improve the visible-light transmittance of the transparentregion TRA, and besides, improve the detection accuracy of the electrodeCE2 functioning as the detection electrode. The transparent conductivefilm TCF2 that is arranged in the transparent region TRA and the frameregion FRA in FIG. 17 functions as, for example, a shield electrode inthe transparent region TRA to supply the common potential when beingconnected to a common-potential circuit CD, and does not need tofunction as the detection electrode.

It would be understood that various modification examples and alterationexamples could have been anticipated within the concept of the presentinvention by those who are skilled in the art, and understood that thesemodification examples and alteration examples are also within the scopeof the present invention. For example, the ones obtained by appropriateaddition, removal, or design-change of the components to/from/into eachof the above-described embodiments by those who are skilled in the artor obtained by addition, omitting, or condition-change of the stepto/from/into each of the above-described embodiments are also within thescope of the present invention as long as they include the outline ofthe present invention.

INDUSTRIAL APPLICABILITY

The present invention can be utilized for a display apparatus.

EXPLANATION OF REFERENCE CHARACTERS

-   -   10, 20 . . . substrate    -   10 f, 20 f . . . front surface (plane, main surface)    -   20 b . . . back surface (plane, main surface)    -   11 to 16 . . . insulating film    -   AL1, AL . . . alignment film    -   BL . . . backlight unit    -   BM . . . light-blocking film    -   CAM . . . camera    -   CD . . . common-potential supply circuit    -   CE, CE2, CE3 . . . electrode    -   CFB, CFG, CFR . . . color filter    -   CH1, CH2 . . . contact hole    -   CL1, CL2, CL3, CL4, CL5 . . . conductive layer    -   CP1 . . . conductive pattern    -   CS . . . capacitance element    -   CVM . . . cover member    -   DA . . . display region    -   DP . . . detection circuit    -   DSP1, DSP2, DSP3, DSP4, DSP5, DSP6 . . . display apparatus    -   FP1, FP2 . . . portion    -   FRA . . . frame region    -   GL . . . scan signal line    -   LQ . . . liquid crystal layer    -   MW3 . . . wiring    -   SL . . . image signal line    -   SLM . . . sealing member (adhesive member)    -   SLT . . . slit    -   TCF1, TCF2 . . . transparent conductive film    -   TH1 . . . through hole    -   TRA . . . transparent region

1-17. (canceled)
 18. A display device comprising: a first substrate; asecond substrate arranged to face the first substrate, and a polarizeron the second substrate, wherein the polarizer includes an opening, thesecond substrate includes a light-blocking film that surrounds an edgeof the opening of the polarizer, the first substrate includes a firsttransparent conductive layer, a second transparent conductive layer, afirst insulating film, and an alignment film, the first insulating filmis between the first transparent conductive layer and the secondtransparent conductive layer, the second transparent conductive layer isbetween the first insulating film and the alignment film, the firsttransparent conductive layer includes a plurality of common electrodesarranged in a matrix, the second transparent conductive layer includes aplurality of pixel electrodes and a transparent conductive film, and thepixel electrodes are arranged outside of the opening of the polarizer,the transparent conductive film overlaps the light-blocking film. 19.The display device of claim 18, wherein the transparent conductive filmis connected to at least one of the common electrodes via a contact holeformed in the first insulating film.
 20. The display device of claim 19,wherein the contact hole overlaps the light-blocking film and does notoverlap the opening of the polarizer.
 21. The display device of claim19, wherein the first substrate and the second substrate are boned toeach other by an outside sealing member and an inside sealing member,the plurality of common electrodes and the plurality of pixel electrodesare located at a display region, the transparent conductive film islocated inside of the display region, the inside sealing member isformed along the opening of the polarizer and overlaps thelight-blocking film, the outside sealing member surrounds the displayregion and the inside sealing member and, the transparent conductivefilm overlaps the inside sealing member.
 22. The display device of claim19, wherein the first substrate and the second substrate are boned toeach other by a sealing member, a liquid crystal layer is between thefirst substrate and the second substrate, and is sealed by the sealingmember, the plurality of common electrodes and the plurality of pixelelectrodes are located at a display region, the transparent conductivefilm is located inside of the display region, the sealing membersurrounds the display region, and the transparent conductive filmoverlaps the liquid crystal layer.
 23. The display device of claim 19,wherein the light-blocking film includes an opening, the opening of thelight-blocking film overlaps the opening of the polarizer, and thetransparent conductive film does not overlap the opening of thelight-blocking film.
 24. The display device of claim 23, wherein thetransparent conductive film is divided into four parts along an edge ofthe opening of the polarizer.
 25. The display device of claim 19,wherein the light-blocking film includes an opening, the opening of thelight-blocking film overlaps the opening of the polarizer, and thetransparent conductive film overlaps the opening of the light-blockingfilm.
 26. The display device of claim 25, wherein the transparentconductive film is divided into four parts inside of the opening of thelight-blocking film.
 27. The display device of claim 18, wherein thelight-blocking film includes an opening, the opening of thelight-blocking film overlaps the opening of the polarizer, thetransparent conductive film is formed in a circular shape, and thecircular shape of the transparent conductive film overlaps thelight-blocking film and the opening of the light-blocking film.
 28. Thedisplay device of claim 27, wherein the first substrate furthercomprises a metal wiring and a second insulating film, the firsttransparent conductive layer is between the second insulating film andthe first insulating film, the second insulating film is between themetal wiring and the first transparent conductive layer, and thetransparent conductive film is connected to the metal wiring via a firstcontact hole formed in the first insulating film and a second contacthole formed in the second insulating film.
 29. The display device ofclaim 28, wherein the first transparent conductive layer furtherincludes a conductive pattern, the transparent conductive film isconnected to the conductive pattern via the first contact hole, and theconductive pattern is connected to the metal wiring via the secondcontact hole.